Method of manufacturing a mask for evaporation

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S592100, C029S885000, C205S090000, C205S119000, C205S122000, C216S012000, C216S051000, C118S213000, C118S301000, C118S406000, C118S504000, C118S721000, C427S468000, C427S504000, C427S510000

Reexamination Certificate

active

10448133

ABSTRACT:
A mask frame assembly for evaporation includes a mask and a frame which supports the mask. The mask includes a metal layer having a predetermined pattern, and a coating layer which is formed on a surface of the metal layer so as to increase a precision of the predetermined pattern and a surface roughness of the mask.

REFERENCES:
patent: 4153654 (1979-05-01), Maffitt et al.
patent: 4374869 (1983-02-01), Dorey II et al.
patent: 4737447 (1988-04-01), Suzuki et al.
patent: 5334908 (1994-08-01), Zimmerman
patent: 5833516 (1998-11-01), De Haas et al.
patent: 09279366 (1997-10-01), None
patent: 09300573 (1997-11-01), None
patent: 19990071583 (1999-11-01), None
patent: 2000012238 (2000-01-01), None
patent: 20000060589 (2001-09-01), None
“Strip waveguides in LiNbO3fabricated by combined metal diffusion and ion implantation”; Heibei, J.; Voges, E.; Quantum Electronics, IEEE Journal of vol. 18, Issue 5; May 1982 pp. 820-825.

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