Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2005-01-31
2008-12-09
Tugbang, A. Dexter (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603120, C029SDIG016, C216S041000, C216S057000, C216S062000, C216S066000, C438S712000, C438S734000
Reexamination Certificate
active
07461445
ABSTRACT:
A method for fabricating a non-electroplated shield using combination patterning and devices formed thereby are disclosed. The method includes depositing a metal layer, such as CZT, removing substantially 75% of the metal layer during a first phase using at least a first removal process and removing a remaining portion of the metal layer during a second phase using at least a second removal process. The first removal process may include depositing a first patterning layer, removing substantially 75% of the metal layer by ion-mill or similar technology and stripping the first patterning layer away. The second removal process may include depositing a second patterning layer and removing the remaining portion of the metal layer using a wet-etch or other etch process and removing the second patterning layer. The deposited metal layer may have a thickness up to several μm and the edges of the shield exhibit a unique step pattern that is visible in a cross-section view of the shield.
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Yamada et al., “Shielded Magnetoresistive Head for High Density Recording”, IEEE Transactions on Magnetics, vol. 26, No. 6, Nov. 1990, pp. 3010-3015.
Hitachi Global Storage Technologies Netherlands BV
Merchant & Gould
Tugbang A. Dexter
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