Method of manufacturing a low emissivity liquid nitrogen dewar

Metal working – Method of mechanical manufacture – Assembling or joining

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

220422, 29458, 156665, B21D 3900

Patent

active

050636510

ABSTRACT:
A liquid nitrogen Dewar includes a spun can for the liquid nitrogen, which spun can is surrounded by an exterior shell. Between the exterior shell and the can is an evacuated space containing a second shell that functions as a radiation shield. The can and both shells are formed of an aluminum alloy having a very high percentage of aluminum. The exterior can surface, interior surface of the exterior shell, and both surfaces of the second shell have clean, non-pitted, smooth, matted, smut free and etched appearances free from discoloration and stains so that these surfaces have low radiation emissivity properties and there is a minimum amount of radiant energy transmitted from the exterior shell to the can and reduced heating of the liquid nitrogen in the can. Each of the surfaces is initially polished, either mechanically, electrochemically or chemically, and then chemically treated with an etchant of nitric acid and hydrofluoric acid for a sufficient duration to achieve the desired appearance.

REFERENCES:
patent: 528513 (1894-10-01), Davis
patent: 2108603 (1938-02-01), Mason
patent: 2116199 (1938-05-01), Held
patent: 2643022 (1953-06-01), Cornell
patent: 2650157 (1953-08-01), Cochran
patent: 2729357 (1956-01-01), Nason, Jr. et al.
patent: 2729551 (1956-01-01), Cohn
patent: 2776069 (1957-01-01), Zimmermann
patent: 2845199 (1958-07-01), Putman et al.
patent: 3191795 (1965-06-01), Molnar
patent: 3438115 (1969-04-01), Humphress et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing a low emissivity liquid nitrogen dewar does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing a low emissivity liquid nitrogen dewar, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing a low emissivity liquid nitrogen dewar will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1004990

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.