Radiation imagery chemistry: process – composition – or product th – Liquid crystal process – composition – or product
Patent
1994-05-18
1995-05-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Liquid crystal process, composition, or product
430321, 430330, 430312, 430314, G02F 1133
Patent
active
054199913
ABSTRACT:
The present invention provides a method of manufacturing a matrix liquid crystal panel provided with picture element electrodes arranged in a matrix and a black mask covering spaces between the picture element electrodes, capable of forming the black mask in accurate resister relative to the picture element electrodes through simple processes. In manufacturing the liquid crystal panel, a conductive transparent layer is formed over one of the major surfaces of a substrate, a positive resist film is formed in a pattern corresponding to the arrangement of the picture element electrodes, the conductive transparent layer is patterned, using the positive resist film as a mask, a negative resist film containing pigment is formed over the major surface of the substrate so as to cover the positive resist film and spaces between the picture element electrodes, the negative resist film is exposed to light projected from behind the other major surface of the substrate so that only portions of the negative resist film coating the spaces between the picture element electrodes are exposed to light and polymerized, and then portions of the negative resist film screened from the light by the positive type of resist material film are removed to pattern the negative resist film in a black mask.
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Jinno et al., "Baking Characteristics of Positive Photoresists", Photographic Sci. and Eng., vol. 21, No. 5, pp. 290-292 (1977).
Bowers Jr. Charles L.
McPherson John A.
Sony Corporation
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