Method of manufacturing a field emission array

Details Method of manufacturing a field emission array Method of manufacturing a field emission array

1996-07-26

1998-11-17

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 50, H01J 902

Patent

active

058367977

ABSTRACT:
A gate electrode material film is deposited on a substrate and formed with an opening for each pixel area, and thereafter a first insulating film and an emitter electrode material film are deposited. Slits for separation of emitter lines are formed by etching the emitter electrode material film at the area intersecting with gate lines to be later formed. Thereafter, a second insulating film is deposited and an element substrate is adhered to the second insulating film to remove the initial substrate. The gate electrode material film is thereafter patterned to form a plurality of gate lines and the emitter electrode material film is patterned to form a plurality of emitter lines.

REFERENCES:
patent: 5141459 (1992-08-01), Zimmerman
patent: 5203731 (1993-04-01), Zimmerman
patent: 5334908 (1994-08-01), Zimmerman
patent: 5720642 (1998-02-01), Hattori
S. Zimmerman, et al., "A Fabrication Method for the Integration of Vacuum Microelectronic Devices", IEEE Transactions on Electron Devices, 38 (1991) Oct. No. 10, pp. 2294-2303.

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