Method of manufacturing a device, by which method various parts

Radiation imagery chemistry: process – composition – or product th – Using reflected radiation – e.g. – reflex copying – etc.

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355 47, 355 48, 355 49, G03F 724, G03F 720

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active

056862300

ABSTRACT:
A method of manufacturing a device provided with a body with a surface, at least a portion of the surface being provided with a radiation-sensitive layer, after which portions of the radiation-sensitive layer are exposed to radiation through a mask, a first portion of the layer being irradiated directly using a first part of a radiation beam projected through the mask and a second portion of the layer being irradiated indirectly using a second part of the radiation beam projected through the mask and reflected onto the second portion, the radiation beam being substantially collimated.

REFERENCES:
patent: 3614225 (1971-10-01), Dinella et al.
patent: 3645178 (1972-02-01), Speicher
patent: 3645179 (1972-02-01), Karol
patent: 4151040 (1979-04-01), Schiffman
patent: 5147760 (1992-09-01), Hoshinoughi et al.
patent: 5168624 (1992-12-01), Shirai
patent: 5461455 (1995-10-01), Coteus et al.
Thomas Richter et al, "Comparing UV Exposure Systems for PCBs", Circuits Manufacturing, vol. 19, No. 11, Nov. 1979, pp. 69, 117-119.
"UV Exposure Systems", Circuits Manufacturing, May 1978, vol. 18, No. 5, pp. 45-48.

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