Method of manufacturing a device and group of masks for this met

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430311, G03C 500

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active

052865843

ABSTRACT:
A method and group of masks for manufacturing a device whereby illumination of a photoresist layer (4) takes place by subsequent illumination through partial masks (1) and 2). During these separate illuminations, complementary scales of grey are obtained in the connection region (7, 8) of the images (5, 6), the total illumination in the connection region (7, 8) being nevertheless complete. According to the invention, good results are obtained when the partial masks (1) and (2) have complementary transparency gradients in the ends (9, 10) corresponding to the scales of grey.

REFERENCES:
patent: 3413119 (1968-11-01), St. Clair
patent: 4231811 (1980-11-01), Somekh et al.
patent: 4246328 (1981-01-01), Sato
patent: 4758502 (1988-07-01), Banks
patent: 4842969 (1989-06-01), Kawatsuki
"Seamless Stiching for Large Area Integrated Circuit Manufacturing", Optical/Laser Microlithography, Burn J. Lin, Editor, Proc. Spie, 922, pp. 188-193.

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