Method of manufacturing a device

Details Method of manufacturing a device Method of manufacturing a device

2005-06-07

2005-06-07

Haran, John T. (Department: 1733)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S539000, C427S569000, C156S272600, C156S273300

Reexamination Certificate

active

06902774

ABSTRACT:
A method of manufacturing a device includes activating a gas containing at least one of hydrogen and of nitrogen by a hollow cathode discharge and exposing a first surface of a first material to the activated gas, thereby generating at the first surface an enrichment of at least one of hydrogen and of nitrogen and applying a further treatment to the enriched surface.

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Copy of Specification, Drawings, and Official Filing Receipt of patent U.S. Appl. No. 10/270,495, filed on Oct. 16, 2002.
LFC, Plasma Cleaning Systems, Most Effective Plasma Chemical Cleaning for Demanding Applications, INFICON, 8 pages, 2001.

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