Method of manufacturing a color selection electrode for a color

Details Method of manufacturing a color selection electrode for a color Method of manufacturing a color selection electrode for a color

1982-01-18

1984-01-24

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

Electrode making

148134, 148155, H01J 9233

Patent

active

044273967

ABSTRACT:
Method of manufacturing a deep drawn CRT mask in which the mask blanks are cut from the steel foil, each mask blank having a pattern of apertures. To facilitate the subsequent deep drawing and in order to obtain a grain size for good magnetic screening by the shadow mask an annealing process is carried out. An optimum grain size of the mask material between 0.015 and 0.040 mm with an average grain size between 0.020 and 0.030 mm is obtained by annealing at a temperature from 600.degree. C. to 850.degree. C. which lies above the temperature at which the mask blanks may adhere together by thermomolecular welding. In order to prevent rejects as a result of said welding, a stack of mask blanks is laid on a curved substrate prior to annealing (FIGS. 3f, 3g), which substrate preferably has the form of a part of a cylinder the radius of which is equal to the radius of the mask after deep drawing. After annealing in a furnace (FIG. 3h) the mask blanks are placed on a flat substratum (FIGS. 3i, 3k, 3l) in which the thermomolecular welds present are broken without damaging the mask blanks. By annealing on the curbed substrate the mask blank engages substantially the mould during deep drawing (FIG. 3m) so that no deformations of the mask blank occur during the deep drawing process.

REFERENCES:
patent: 907193 (1908-12-01), Steele
patent: 3898108 (1975-08-01), Iwasaki et al.
patent: 4210843 (1980-07-01), Avadani

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