Metal working – Method of mechanical manufacture – Electrical device making
Patent
1994-04-01
1995-06-06
Arbes, Carl J.
Metal working
Method of mechanical manufacture
Electrical device making
29828, 174 36, 174250, H05K 310
Patent
active
054210836
ABSTRACT:
A method of manufacturing a circuit carrying substrate having one or more coaxial via holes. The center core or inner layer (330) of the circuit carrying substrate is a dielectric material that has a plated (339) through hole or via (335) coupling the two surfaces of the inner layer together. One side of the inner layer has a first metallization pattern (336) and the other side has a second metallization pattern (338) on it. The through hole is electrically conductive (339) and connects portions of the first and second metallization patterns. The plated through hole is filled with a dielectric material (340). A first dielectric layer (342) is formed on one side of the inner layer, and a second dielectric layer (344) is formed on the other side of the inner layer, so that the dielectric layers cover the first and second metallization patterns and the filled via hole. A third metallization pattern (350) is formed on the first dielectric layer, and a fourth metallization pattern (360) is formed on the second dielectric layer. A second via hole (370) is formed within the first via hole, substantially concentric to and electrically insulated from the first via hole, to electrically connect the third and fourth metallization patterns.
REFERENCES:
patent: 4642889 (1987-02-01), Grabbe
patent: 4675788 (1987-02-01), Breitling et al.
patent: 4776087 (1988-10-01), Cronin et al.
patent: 5233133 (1993-08-01), Iwasaki et al.
patent: 5323534 (1994-06-01), Iwasaki et al.
patent: 5363550 (1994-11-01), Aitken et al.
Nounou Fadia
Suppelsa Anthony B.
Suppelsa Anthony J.
Arbes Carl J.
Dorinski Dale W.
Motorola Inc.
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