Etching a substrate: processes – Forming or treating electrical conductor article
Patent
1997-11-14
2000-04-04
Powell, William
Etching a substrate: processes
Forming or treating electrical conductor article
216 34, B22C 122
Patent
active
060457139
ABSTRACT:
A method of manufacturing a 2-layered flexible substrate includes forming an underlying metal layer on an insulation film with a deposition layer formed by a dry plating method using at least one of nickel, copper-nickel alloy, chromium and chromium oxide and a copper deposition layer formed by a dry plating method on the noted deposition layer, then forming a primary electric copper plated deposition layer on the underlying metal layer, then applying a treatment using at least one alkaline solution selected from inorganic alkaline solutions and organic alkaline solutions, then forming an electroless copper plated deposition layer as an intermediate metal layer on the primary electric copper plated deposition layer and, finally, forming a secondary electric copper plated deposition layer on the intermediate metal layer, thereby finally forming a copper conductor layer of 1 to 35 .mu.m thickness on the insulation film.
REFERENCES:
patent: 5721007 (1998-02-01), Lynch et al.
patent: 5800722 (1998-09-01), Tsuyoshi et al.
Sakurada Takehiko
Sugiura Takashi
Takabatake Toshinobu
Tamiya Yukihiro
Powell William
Sumitomo Metal & Mining Co., Ltd.
LandOfFree
Method of manufacturing a 2-layered flexible substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing a 2-layered flexible substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing a 2-layered flexible substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-361708