Semiconductor device manufacturing: process – Manufacture of electrical device controlled printhead
Reexamination Certificate
1998-07-10
2001-05-08
Niebling, John F. (Department: 2812)
Semiconductor device manufacturing: process
Manufacture of electrical device controlled printhead
C347S020000, C347S047000, C347S056000
Reexamination Certificate
active
06228668
ABSTRACT:
CROSS REFERENCES TO REIATED APPLICATIONS
The following co-pending US patent applications, identified by their U.S. patent application Serial Numbers (U.S.S.N.), were filed simultaneously to the present application on Jul. 10, 1998, and are hereby incorporated by cross-reference.
09/113,060; 09/113,070; 09/113,073; 09/112,748; 09/112,747; 09/112,776; 09/112,750; 09/112,746; 09/112,743; 09/112,742; 09/112,741; 09/112,740; 09/112,739; 09/113,053; 09/112,738; 09/113,067; 09/113,063; 09/113,069; 09/112,744; 09/113,058; 09/112,777; 09/113,224; 09/112,804; 09/112,805; 09/113,072; 09/112,785; 09/112,797; 09/112,796; 09/113,071; 09/112,824; 09/113,090; 09/112,823; 09/113,222; 09/112,786; 09/113,051; 09/112,782; 09/113,056; 09/113,059; 09/113,091; 09/112,753; 09/113,055; 09/113,057; 09/113,054; 09/112,752; 09/112,759; 09/112,757; 09/112,758; 09/113,107; 09/112,829; 09/112,792; 09/112,791; 09/112,790; 09/112,789; 09/112,788; 09/112,795; 09/112,749; 09/112,784; 09/112,783; 09/112,763; 09/112,762; 09/112,737; 09/112,761; 09/113,223; 09/112,781; 09/113,052; 09/112,834; 09/113,103; 09/113,101; 09/112,751; 09/112,787; 09/112,802; 09/112,803; 09/113,097; 09/113,099; 09/113,084; 09/113,066; 09/112,778; 09/112,779; 09/113,077; 09/113,061; 09/112,818; 09/112,816; 09/112,772; 09/112,819; 09/112,815; 09/113,096; 09/113,068; 09/113,095; 09/112,808; 09/112,809; 09/112,780; 09/113,083; 09/113,121; 09/113,122; 09/112,793; 09/112,794; 09/113,128; 09/113,127; 09/112,756; 09/112,755; 09/112,754; 09/112,811; 09/112,812; 09/112,813; 09/112,814; 09/112,764; 09/112,765; 09/112,767; 09/112,768; 09/112,807; 09/112,806; 09/112,820; 09/112,821; 09/112,822; 09/112,825; 09/112,826; 09/112,827; 09/112,828; 09/113,111; 09/113,108; 09/113,109; 09/113,123; 09/113,114; 09/113,115; 09/113,129; 09/113,124; 09/113,125; 09/113,126; 09/113,119; 09/113,120; 09/113,221; 09/113,116; 09/113,118; 09/113,117; 09/113,113; 09/113,130; 09/113,110; 09/113,112; 09/113,087; 09/113,074; 09/113,089; 09/113,088; 09/112,771; 09/112,769; 09/112,770; 09/112,817; 09/113,076; 09/112,798; 09/112,801; 09/112,800; 09/112,799; 09/113,098; 09/112,833; 09/112,832; 09/112,831; 09/112,830; 09/112,836; 09/112,835; 09/113,102; 09/113,106; 09/113,105; 09/113,104; 09/112,810; 091112,766; 09/113,085; 09/113,086; 09/113,094; 09/112,760; 09/112,773; 09/112,774; 09/112,775; 09/112,745; 09/113,092; 09/113,100; 09/113,093; 09/113,062; 09/113,064; 09/113,082; 09/113,081; 09/113,080; 09/113,079; 09/113,065; 09/113,078; 09/113,075;
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
Not applicable.
FIELD OF THE INVENTION
The present invention relates to the field of inkjet printers and discloses an inkjet printing system which includes a bend actuator interconnected into a paddle for the ejection of ink through an ink ejection nozzle. In particular, the present invention discloses a method of Manufacture of a thermally actuated ink jet printer having a series of thermal actuator units.
BACKGROUND OF THE INVENTION
Many ink jet printing mechanisms are known. Unfortunately, in mass production techniques, the production of ink jet heads is quite difficult For example, often, the orifice or nozzle plate is constructed separately from the ink supply and ink ejection mechanism and bonded to the mechanism at a later stage (Hewlett-Packard Journal, Vol. 36 no 5, pp33-37 (1985)). These separate material processing steps required in handling such precision devices often add a substantial expense in manufacturing.
Additionally, side shooting ink jet technologies (U.S. Pat. No. 4,899,181) are often used but again, this limits the amount of mass production throughput given any particular capital investment.
Additionally, more esoteric techniques are also often utilised. These can include electroforming of nickel stage (Hewlett-Packard Journal, Vol. 36 no 5, pp33-37 (1985)), electro-discharge machining, laser ablation (U.S. Pat. No.5,208,604), micro-punching, etc.
The utilisation of the above techniques is likely to add substantial expense to the mass production of ink jet print heads and therefore add substantially to their final cost.
It would therefore be desirable if an efficient system for the mass production of ink jet print heads could be developed.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide for a method of manufacture of an ink ejection nozzle arrangement suitable for incorporation into an inkjet printhead arrangement for the ejection of ink on demand from a nozzle chamber in an efficient manner. In particular the ink jet printer can comprise a thermally actuated ink jet printer having a series of thermal actuator units.
In accordance with a first aspect of the present invention, there is provided a method of manufacture of a thermally actuated ink jet printer having a series of thermal actuator units wherein an array of nozzles are formed on a substrate utilising planar monolithic deposition, lithographic and etching processes.
Multiple ink jet heads are preferably formed simultaneously on a single planar substrate. The substrate can be a silicon wafer. The print heads are preferably formed utilising standard vlsi/ulsi processing. Integrated drive electronics are preferably formed on the same substrate. The integrated drive electronics can be formed utilising a CMOS fabrication process.
Ink can be ejected from the substrate substantially normal to the substrate.
In accordance with a further aspect of the present invention, there is provided a method of manufacture of an ink jet print head arrangement including a series of nozzle chambers, the method comprising the steps of: (a) utilizing an initial semiconductor wafer having an electrical circuitry layer formed thereon; (b) etching the electrical circuitry layer so as to define a nozzle chamber area; (c) depositing and etching a first sacrificial layer, the etching defining a series of nozzle chamber walls and an actuator anchor point; (d) depositing a first heater material layer; (e) depositing an intermediate material layer; (f) etching the first heater material layer and the intermediate material layer to define portions of an actuator, ejection paddle and nozzle chamber walls; (g) depositing and etching a second sacrificial layer, the etching including etching a cavity defining a portion of the nozzle chamber walls; (h) depositing and etching a further glass layer to define the roof of the nozzle chamber and the walls thereof; (i) etching an ink supply channel through the wafer to form a fluid communication with the nozzle chamber; (j) etching away remaining sacrificial material.
The intermediate layer can comprise substantially glass. The first heater material layer can comprise substantially Titanium Nitride.
The steps further can include the step of etching anti-wicking notches in the surface of the circuitry layer.
Further, there is preferably included the step of depositing corrosion barriers over portions of the arrangement so as to reduce corrosion effects and the etching of layers preferably can includes etching vias so as to allow for the electrical interconnection of portions of subsequent layers. The wafer can comprise a double side polished CMOS wafer.
The step (j) can comprise a through wafer etch from a back surface of the wafer. The steps aforementioned are preferably also utilized to simultaneously separate the wafer into separate printheads.
REFERENCES:
patent: 5889541 (1999-03-01), Bobrow et al.
patent: 5897789 (1999-04-01), Weber
Lattin Christopher
Niebling John F.
Silverbrook Research Pty Ltd
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