Method of making unreacted metal/aluminum sputter target

Details Method of making unreacted metal/aluminum sputter target Method of making unreacted metal/aluminum sputter target

1997-09-09

2000-01-04

Wyszomierski, George

Metal treatment

Process of modifying or maintaining internal physical...

Treating loose metal powder, particle or flake

419 23, 419 32, 419 68, B22F 302

Patent

active

060105836

ABSTRACT:
A high performance, high density sputtering target and a method of making. An aluminum and non-aluminum reactive metal powder blend is subjected to cold pressing under pressure, machining, evacuating, and hot pressing under pressure. The aluminum and non-aluminum metal react directly to yield a high performance, high density sputter target containing greater than about 2% aluminum with substantially uniform composition across the body.

REFERENCES:
patent: 3877930 (1975-04-01), Volin
patent: 4554130 (1985-11-01), Ecer
patent: 4752335 (1988-06-01), Korb
patent: 4788611 (1988-11-01), Kobayashi et al.
patent: 4832741 (1989-05-01), Couper
patent: 4921664 (1990-05-01), Couper
patent: 5439500 (1995-08-01), Marx
patent: 5594186 (1997-01-01), Krause et al.

Affiliated with

Also associated with

Rating

Method of making unreacted metal/aluminum sputter target does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making unreacted metal/aluminum sputter target, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making unreacted metal/aluminum sputter target will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1069641