Method of making thin-film magnetic head

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor – With peripheral feature due to separation of smaller...

Reexamination Certificate

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C257S295000, C257S296000, C257S421000, C257S422000, C360S313000, C360S314000, C360S317000, C428S209000, C428S185000, C428S469000

Reexamination Certificate

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07057260

ABSTRACT:
In the method of making a thin-film magnetic head in accordance with the present invention, an alignment mark is electrically connected to a multilayer film which will later become a TMR film. Therefore, when the alignment mark is irradiated with a position correcting electron beam in order to correct a drawing position in the subsequent step of electron beam lithography, electric charges of the electron beam flow into the multilayer film without staying in the alignment mark. As a consequence, the position correcting electron beam does not lose its straightforwardness, whereby the drawing position in electron beam lithography can be corrected accurately.

REFERENCES:
patent: 6534159 (2003-03-01), Newman et al.
patent: 6886239 (2005-05-01), Kasahara et al.

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