Method of making thin antireflection coating for electro-optical

Details Method of making thin antireflection coating for electro-optical Method of making thin antireflection coating for electro-optical

1979-02-23

1980-07-01

Smith, John D.

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

313 94, 313466, 427 68, 427 69, 427 70, 427 74, 427124, 427125, H01J 2928, H01J 170

Patent

active

042106818

ABSTRACT:
An absorbing coating consisting of three layers sequentially deposited on e aluminized phosphor screen of an electro-optical device such as an image intensifier. The layers are: a transparent dielectric layer with a thickness of about one quarter wavelength of radiation to be absorbed, a thin metal semitransparent layer, and an aluminum oxide protective layer for the thin metal layer. The coating is transparent to electrons bombarding the phosphor, but absorbs radiation which might pass through the photocathode and be reflected from the phosphor aluminum coating back to the photocathode. Such reflected radiation can cause spurious output electrons from the photocathode.

REFERENCES:
patent: 3280356 (1966-07-01), Stoudenheimer et al.
patent: 3692576 (1972-09-01), Takayanagi et al.
patent: 3767447 (1973-10-01), Mizuno et al.
patent: 3911165 (1975-10-01), Kanai et al.
patent: 4048039 (1977-09-01), Daxinger

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