Method of making tetrahedral amorphous carbon film including...

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation

Reexamination Certificate

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C427S561000, C427S577000, C427S249700

Reexamination Certificate

active

06913795

ABSTRACT:
A method of making a tetrahedral amorphous carbon (ta-C) film comprises depositing carbon atoms over the surface of an object. The surface of the object is kept exposed to fluorine atoms during the deposition of the carbon atoms. The method allows the fluorine atoms to scatter within the deposited carbon atoms in the tetrahedral amorphous carbon film. The hardness of the tetrahedral amorphous carbon film can be improved in response to an increased content of sp3carbon bonds included within the tetrahedral amorphous carbon film. In addition, the tetrahedral amorphous carbon film still provides a sufficient repellent performance to water due to the fluorine atoms existing near the exposed surface of the tetrahedral amorphous carbon film.

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Weiler, M., “Highly tetrahedral, diamond-like amorphous hydrogenated carbon prepared from a plasma beam source.” Appl. Phys. Lett. 64(21) May 1994, pp. 2797-2799.

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