Method of making substractive rim phase shifting masks

Details Method of making substractive rim phase shifting masks Method of making substractive rim phase shifting masks

1995-06-13

1996-03-05

Fourson, George

Etching a substrate: processes

Forming or treating mask used for its nonetching function

430 5, B44C 122

Patent

active

054959594

ABSTRACT:
An improved method for fabricating phase shifting masks suitable for semiconductor manufacture is provided. A photolithographic mask blank comprising a transparent substrate having an opaque layer of a standard thickness is provided. Using a photoresist mask, the opaque layer is patterned and etched with openings to form opaque light blockers. The substrate under the openings is then etched to a predetermined depth using the same photoresist mask or the opaque layer as a hard mask. A phase shift material, such as silicon dioxide, is then deposited over the opaque light blockers and into the openings to form rim phase shifters on the sidewalls of the light blockers and light transmission areas in the openings. The depth of the etch into the substrate and the thickness of the opaque layer determines the amount of the phase shift. These parameters are controlled to achieve a phase shift of 180.degree. or odd multiple thereof.

REFERENCES:
patent: 5079113 (1992-01-01), Ohta et al.
patent: 5126220 (1992-06-01), Tokitomo et al.
patent: 5153083 (1992-10-01), Garofalo et al.
patent: 5194344 (1993-03-01), Cathey et al.
patent: 5194345 (1993-03-01), Rolfson
patent: 5194346 (1993-03-01), Rolfson et al.
patent: 5208125 (1993-05-01), Lowrey et al.
patent: 5217830 (1993-06-01), Lowrey
patent: 5225035 (1993-07-01), Rolfson
patent: 5240796 (1993-08-01), Lee et al.
patent: 5281500 (1994-01-01), Cathey et al.
patent: 5288568 (1994-02-01), Cathey, Jr.
patent: 5290647 (1994-03-01), Miyazaki et al.
patent: 5292623 (1994-03-01), Kemp et al.
Lin, Burn J., "Phase Shifting and Other Challenges in Optical Mask Technology", IBM-EF-15 (Sep. 26, 1990).

Affiliated with

Also associated with

Rating

Method of making substractive rim phase shifting masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making substractive rim phase shifting masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making substractive rim phase shifting masks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1407322