Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1982-09-20
1983-12-20
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192R, 204298, C23C 1500
Patent
active
044216220
ABSTRACT:
A degradable substrate surface (e.g. a glass sheet covered by a pure metal film) is overcoated with an oxide film deposited by high rate reactive sputtering in the presence of hydrogen to avoid degradation of the substrate. The addition of hydrogen to the sputtering chamber atmosphere substantially eliminates degradation of pure metal films, etc. which would otherwise be damaged during the reactive sputtering of an oxide overcoat. The method is disclosed for producing low emissivity symmetrical three layer coatings formed on a substrate by high rate sputtering with the intermediate layer formed by a conductive silver film and the adjacent layers formed from stoichiometric tin oxide films.
Alternatively a degradable substrate surface is overcoated with an oxide film having a thickness exceeding 100 angstroms without degradation by reactively sputtering an extremely thin oxide coating onto the surface at a relatively high sputtering rate and the remainder of the oxide film is thereafter deposited over the thin initial oxide coating. A brief interval is required to enable the initial oxide film to "relax", or take a set, before the additional film is deposited.
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Kittler et al., SPIE, vol. 325, (1982), pp. 61-64.
Munz et al., SPIE, vol. 325, (1982), pp. 65-73.
Advanced Coating Technology, Inc.
Demers Arthur P.
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