Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1993-08-24
1995-07-11
Rosenberger, Richard A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
G03F 900, H01L 2130
Patent
active
054326087
ABSTRACT:
According to the present invention, in making alignment between a semiconductor integrated circuit wafer and a mask or a reticle in light exposure of the wafer with a monochromatic light such as g-, i- or h-line of a mercury lamp, using a reduced stepping exposure system, light from a predetermined pattern on the wafer is taken out to an off-axis position and observed according to Through-the-Lens method; in this case as a characteristic feature of the invention, the observation light taken out from below the reticle is passed through chromatic aberration correcting lenses, thereby permitting the use of a polychromatic or continuous spectrum light.
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Iriki Nobuyuki
Kawanabe Takao
Komoriya Susumu
Nakagawa Shinya
Oosakaya Takayoshi
Hitachi , Ltd.
Rosenberger Richard A.
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