Method of making semiconductor device with memory cells and peri

Fishing – trapping – and vermin destroying

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437 43, 437 44, 437 48, H01L 2170

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active

053526201

ABSTRACT:
Disclosed is a semiconductor integrated circuit device which includes first field effect transistors of an LDD structure having a floating gate as memory cells and second field effect transistors of the LDD structure as elements other than the memory cells, and which is used as EPROM. A shallow, low impurity concentration region of the first field effect transistor as a part of its source or drain region has a higher impurity concentration than a shallow, low impurity concentration region of the second field effect transistor as a part of its source or drain region.

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