Method of making semiconductor device employing self diffusion o

Details Method of making semiconductor device employing self diffusion o Method of making semiconductor device employing self diffusion o

1991-08-23

1993-06-22

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437187, 148DIG26, H01L 21265

Patent

active

052216349

ABSTRACT:
The invention relates to such semiconductor devices comprising: a wiring layer with a predetermined pattern formed over a major surface of a semiconductor substrate through an insulating film, a diffusion layer formed under a contact hole formed in said insulating film in an adjacent region of the wiring layer, and a conductive layer deposited into said contact hole in a state of being connected to said wiring layer.

REFERENCES:
patent: 4069067 (1978-01-01), Ichinohe
patent: 4305760 (1981-12-01), Trudel
patent: 4322736 (1982-03-01), Sasaki et al.
patent: 4453306 (1984-06-01), Lynch et al.
patent: 4619037 (1986-10-01), Taguchi et al.
patent: 4866009 (1989-09-01), Matsuda
patent: 4912540 (1990-03-01), Sander et al.

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