Method of making resistive films

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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338315, C23C 1500

Patent

active

040160610

ABSTRACT:
A resistive film composition consisting essentially of AlN and solid solution of TiN and ZrN and a method of making the same by means of cathodic sputtering.

REFERENCES:
patent: 3395089 (1968-07-01), Mayer et al.
patent: 3664931 (1972-05-01), Gerstenberg
patent: 3736242 (1973-05-01), Schwartz et al.

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