Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1974-01-16
1977-04-05
Vertiz, Oscar R.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
338315, C23C 1500
Patent
active
040160610
ABSTRACT:
A resistive film composition consisting essentially of AlN and solid solution of TiN and ZrN and a method of making the same by means of cathodic sputtering.
REFERENCES:
patent: 3395089 (1968-07-01), Mayer et al.
patent: 3664931 (1972-05-01), Gerstenberg
patent: 3736242 (1973-05-01), Schwartz et al.
Hayakawa Shigeru
Hosomi Fumio
Wasa Kiyotaka
Langel Wayne A.
Matsushita Electric - Industrial Co., Ltd.
Vertiz Oscar R.
LandOfFree
Method of making resistive films does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making resistive films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making resistive films will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2264898