Method of making planar devices by direct implantation into subs

Details Method of making planar devices by direct implantation into subs Method of making planar devices by direct implantation into subs

1980-10-29

1982-07-27

Roy, Upendra

Metal treatment

Compositions

Heat treating

148187, 156643, 357 91, 427 431, H01L 2126, H01L 21265

Patent

active

043415717

ABSTRACT:
An ion implantation process uses exclusively photoresist masks to cover a substrate except in the regions to be implanted with ions. The photoresist masks are removed after each ion implantation by plasma etching.

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Moran et al., J. Vac. Sci. Technol., 16 (Nov.-Dec. 1979), 1620-1624.
Dearnaley et al., (eds.), Ion Implantation, North Holland, N.Y., 1973, pp. 503-507, 510, 511.

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