Method of making photo alignment structure

Details Method of making photo alignment structure Method of making photo alignment structure

1998-09-30

2000-10-17

Nguyen, Tuan H.

Semiconductor device manufacturing: process

Formation of electrically isolated lateral semiconductive...

Having substrate registration feature

438401, 438462, 257797, H01L 2176

Patent

active

061331112

ABSTRACT:
A photo alignment structure integral with a substrate enables the alignment apparatus to receive a reflected light signature of the surface topography of the alignment structure. As the circuit is constructed, the alignment target may be built in tandem with the process. The alignment structure is constructed so that its surface will retain sufficient topography to enable the alignment apparatus to properly align.

REFERENCES:
patent: 5401691 (1995-03-01), Caldwell
patent: 5503962 (1996-04-01), Caldwell
patent: 5578519 (1996-11-01), Cho
patent: 5640053 (1997-06-01), Caldwell
patent: 5643406 (1997-07-01), Shimomura et al.
patent: 5877562 (1999-03-01), Sur et al.

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