Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
Patent
1998-09-30
2000-10-17
Nguyen, Tuan H.
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Having substrate registration feature
438401, 438462, 257797, H01L 2176
Patent
active
061331112
ABSTRACT:
A photo alignment structure integral with a substrate enables the alignment apparatus to receive a reflected light signature of the surface topography of the alignment structure. As the circuit is constructed, the alignment target may be built in tandem with the process. The alignment structure is constructed so that its surface will retain sufficient topography to enable the alignment apparatus to properly align.
REFERENCES:
patent: 5401691 (1995-03-01), Caldwell
patent: 5503962 (1996-04-01), Caldwell
patent: 5578519 (1996-11-01), Cho
patent: 5640053 (1997-06-01), Caldwell
patent: 5643406 (1997-07-01), Shimomura et al.
patent: 5877562 (1999-03-01), Sur et al.
Bothra Subhas
Sur Harlan
Nguyen Tuan H.
Philips Electronics North America Corporation
Thompson Craig
Zawilski Peter
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