Method of making pattern data for a sewing machine

Sewing – Elements – Frames

Patent

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Details

112158E, 112439, D05C 1700

Patent

active

044572468

ABSTRACT:
A method of forming a stitch pattern is disclosed in which at least two closely spaced or coincident end stitches are present. The overall pattern is divided into overlapping block sections. In one block, a first group of stitches is formed followed by a second group of stitches being formed in an adjacent block. The number of stitches between closely spaced or coincident stitches that results is reduced. Therefore the accumulated error of fabric feeding pitches and the distance between the two end stitches is reduced resulting in a more precisely constructed overall pattern.

REFERENCES:
patent: 4200048 (1980-04-01), Makabe et al.
patent: 4223616 (1980-09-01), Kunimatsu et al.
patent: 4227472 (1980-10-01), Bergvall
patent: 4266493 (1981-05-01), Hanyu et al.

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