Method of making passivated antireflective coating for photovolt

Details Method of making passivated antireflective coating for photovolt Method of making passivated antireflective coating for photovolt

1989-03-31

1991-04-30

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437225, 437974, 437227, 357 30, 136255, 136256, H01L 3118

Patent

active

050117823

ABSTRACT:
The performance of a silicon photovoltaic cell is improved while process yield is maintained by first forming doped regions in a major surface of a silicon wafer and providing electrical interconnections to the doped regions prior to thinning the wafer by etching another major surface of the wafer. A passivating antireflection layer is applied to the etched surface after the surface is precleaned. The precleaning can be by ammonia plasma applied in situ as a precursor to depositing silicon nitride as the passivation layer.

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patent: 4946716 (1990-08-01), Corrie
"Design of Antireflection Coatings for Textured Silicon Solar Cells"; B. L. Sopori et al.; Solar Cells, 8 (1983), pp. 249-261.

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