Etching a substrate: processes – Forming or treating thermal ink jet article
Patent
1994-11-08
1996-10-01
Fourson, George
Etching a substrate: processes
Forming or treating thermal ink jet article
430394, 430326, 430312, 205 75, 205127, 205135, 298901, B41J 216
Patent
active
055608370
ABSTRACT:
A process for fabricating a thin-film structure using a transparent substrate is disclosed. A first structure, such as a ring having a central pillar, is formed of a conductive material on a surface of the substrate. A photoresist material pillar is formed on top of the conductive material central pillar by exposure through the transparent material. Such structures are useful as mandrel structures in the forming of precision thin-film components such as nozzle plates, mesh filter screens, and the like, for ink-jet pens.
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Fourson George
Hewlett--Packard Company
Kirkpatrick Scott
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