Method of making II-VI semiconductor infrared light detector

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes joining independent crystals

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117 54, 117957, 437 91, C30B 2504

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active

055356990

ABSTRACT:
A method for producing a photo-voltaic infrared detector including growing a crystalline CdHgTe layer on a CdTe substrate by liquid phase epitaxy using a growth melt including tellurium as a solvent to which indium is added as a dopant impurity in a concentration of from 0.01 to 0.1 ppm; annealing the CdHgTe layer to produce a p-type CdHgTe layer including indium as an n-type background dopant impurity; forming an n-type region of a desired depth as a light receiving region at the surface of the p-type CdHgTe layer by implanting a dopant impurity producing n-type conductivity and annealing; and forming an n-side electrode on the n-type region and a p-side electrode a prescribed distance from the n-type region on the p-type CdHgTe layer.

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Astles et al, "Improved Control Of Composition And Electrical Properties Of Liquid Phase Epitaxial (CdHg)Te Layers", Journal of Crystal Growth 117, 1992, pp. 213-217.
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Lapides et al, "The Characterization Of Intentional Dopants In HgCdTe Using SIMS, Hall-Effect, And C-V Measurements", Mat. Res. Soc. Symp. Proc. vol. 48, 1985, pp. 365-375.

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