Method of making highly stable modified amorphous silicon and ge

Metal treatment – Compositions – Heat treating

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148174, 29572, 29576B, 29576T, 136258, 357 2, H01L 21203, H01L 21263

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044027621

ABSTRACT:
A method of modifying amorphous films of Group IV elements such as silicon and germanium and alloys thereof with carbon by the addition of Group I elements hydrogen and/or Group VII elements fluorine and chlorine in which an amorphous film of the Group IV elements or alloys thereof is vacuum deposited on a substrate at a temperature equal to or slightly above room temperature, the film is annealed in an inert gas or in a vacuum and the annealed film is modified by bombardment with an energetic current of ions or atoms of the Group I and/or Group VII elements by means of a plasma gun or ion gun having characteristics similar to a thetatron.

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Jang, J. et al., Journal of Non-Crystalline Solids, vol. 35-36, (1980), pp. 313-318.

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