Method of making gate array masks

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364489, 364488, G06F 1560

Patent

active

050180746

ABSTRACT:
A method for making gate array masks in which a mask set for an existing set of gate array cells are converted to follow new design rules requiring a non-uniform transformation of circuit components is carried out by manually converting a defining set of circuit components from a first set of grid points to a second set, the second set being specified by the new design rules, and thereafter automatically converting grid points in the remaining gate array cells to the new system.

REFERENCES:
patent: T938005 (1975-09-01), Colton et al.
patent: 4441207 (1984-04-01), Lougheed et al.
patent: 4803636 (1989-02-01), Nishiyama et al.
patent: 4882690 (1989-11-01), Shinsha et al.
"A Dense Gate Matrix Layout Method for MOS ILSI", by A. D. Lopez et al., IEEE Trans. Electron Devices, vol. ED-27, pp. 1671-1675, Aug. 1980.

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