Method of making ferroelectric memory devices

Fishing – trapping – and vermin destroying

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437 49, 437 52, H01L 2190, H01L 2995

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050249649

ABSTRACT:
A monolithic semiconductor integrated circuit-ferroelectric device is disclosed together with the method of manufacturing same. The ferroelectric device preferably consists of a layer of stable ferroelectric potassium nitrate disposed between electrical contacts positioned on opposite surfaces of the ferroelectric layer. The ferroelectric layer has a thickness of less than 110 microns, and preferably falling within a range of from 100 Angstrom units to 25,000 Angstrom units. The process of manufacturing the monolithic structure is multi-stepped and is particularly adapted for fabricating a potassium nitrate ferroelectric memory on a semiconductor integrated circuit.

REFERENCES:
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patent: 4149302 (1979-04-01), Cook
patent: 4195355 (1980-03-01), Rohrer
Pulvari "A New Graded Electrode for Forming Intimate Contact with Ferroelectrics", IEEE Trans. on Elect. Dev. ED 16 pp. 532-535 (Jun. 1969).

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