Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1983-06-23
1984-05-29
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192D, 204192N, 204298, C23C 1500
Patent
active
044513445
ABSTRACT:
The sputter deposition of a thin film of material on both sides of a thin substrate is performed by positioning the substrate sides orthogonal to the target and preferably radial to the deposition center of the sputter system. The vapor deposition of alumina on a thin ferrite core for a magnetic head is accomplished by positioning the ferrite substrate in the vacuum chamber orthogonally to the target and radial to the particle deposition center. The alumina is deposited on both sides of the ferrite core simultaneously to substantially the same thickness. The deposition on both sides of the ferrite core protects the core against width erosion, and minimizes bending stress. In addition, signal output of the ferrite core when used in a magnetic head is increased.
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Burkhart Robert W.
Cox Allen R.
Hartley John D.
Demers Arthur P.
International Business Machines Corp.
Somermeyer H. F.
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