Method of making diffused buried plate trench DRAM cell array

Details Method of making diffused buried plate trench DRAM cell array Method of making diffused buried plate trench DRAM cell array

1993-08-26

1994-09-20

Thomas, Tom

Fishing, trapping, and vermin destroying

437 47, 437 60, 437919, H01L 2170

Patent

active

053489055

ABSTRACT:
A high density substrate plate DRAM cell memory device and process are described in which a buried plate region is formed adjacent to deep trench capacitors such that the substrate region of DRAM transfer FETs can be electrically isolated from other FETs on a semiconductor substrate. The buried region is partially formed by lateral outdiffusion from the sidewalls of the deep trenches and partially formed by an N-well surface diffusion which entirely surrounds the DRAM array region.

REFERENCES:
patent: 4688063 (1987-08-01), Lu et al.
patent: 4794434 (1988-12-01), Pelley
patent: 4801988 (1989-01-01), Kenney
patent: 4829017 (1989-05-01), Malhi
patent: 4873560 (1989-10-01), Sunami et al.
patent: 4912054 (1990-03-01), Tomassetti
patent: 4918502 (1990-04-01), Kaga et al.
patent: 4944682 (1990-07-01), Cronin et al.
patent: 5141886 (1992-08-01), Mori
"Trench and Compact Structures for DRAMs" by P. Chatterjee et al, International Electron Devices Meeting 1986, Technical Digest paper 6.1, pp. 128-131.
"CMOS Semiconductor Memory Structural Modification to Allow Increased Memory Charge" Anonymous, IBM Technical Disclosure Bulletin, vol. 31, No. 11, Apr. 1989, pp. 162-165.
"A 45-ns 16Mb DRAM with Triple-Well Structure" by S. Fujii et al, IEEE Journal of Solid-State Circuits, vol. 24, No. 5, Oct. 1989, pp. 1170-1175.
"New Well Structure for Deep Sub-micron CMOS/BiCMOS Using Thin Epitaxy over Buried Layer and Trench Isolation" by Y. Okazaki et al., 1990 Symposium on VLSI Technology, Digest of Technical Papers, paper 6C-4, pp. 83-84.

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