Method of making controlled-pore silica structures for high temp

Details Method of making controlled-pore silica structures for high temp Method of making controlled-pore silica structures for high temp

1979-02-12

1980-09-09

Kellogg, Arthur D.

Glass manufacturing

Processes

With pore forming in situ

65 31, 264 44, 264 453, C04B 3514

Patent

active

042215781

ABSTRACT:
This invention is concerned with the production of porous, essentially alkali metal-free amorphous bodies demonstrating excellent thermal insulating properties and being capable of long term use at temperatures up to 1000.degree. C. The bodies exhibit an average pore diameter of between about 100A-10,000A with at least 80% of the pores coming within .+-.20% of the average pore diameter value. The bodies consist essentially, as expressed in weight percent on the oxide basis, of 0.25-5% of an infrared radiation absorbing metal oxide, 1-10% of an infrared radiation scattering metal oxide, and the remainder SiO.sub.2.

REFERENCES:
patent: 3743601 (1973-07-01), Rao et al.
patent: 3929439 (1975-12-01), Pierce
patent: 4112032 (1978-09-01), Blaszyk et al.

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