Method of making complementary bipolar polysilicon emitter devic

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 59, 437 61, 437162, 437186, 437193, 437233, 257370, 257378, 257511, H01L 21265

Patent

active

055411207

ABSTRACT:
Bipolar transistors and MOS transistors on a single semiconductor substrate involves depositing a single layer of polysilicon on a substrate, including complementary transistors of either or both types, and a method for fabricating same. The devices are made by depositing a single layer of polysilicon on a substrate and etching narrow slots in the form of rings around every bipolar emitter area, which slots are thereafter filler with an insulating oxide. Then, emitters and extrinsic base regions are formed. The emitters are self-aligned to the extrinsic base regions. An optical cladding procedure produces a surface layer of a silicide compound, a low resistance conductor. The resulting structure yields a high-performance device in which the size constraints are at a minimum and contact regions may be made at the top surface of the device.

REFERENCES:
patent: 4839305 (1989-06-01), Brighton
patent: 4868135 (1989-09-01), Ogura et al.
patent: 5008210 (1991-04-01), Chiang et al.
patent: 5409845 (1995-04-01), Robinson et al.
patent: 5444285 (1995-08-01), Robinson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making complementary bipolar polysilicon emitter devic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making complementary bipolar polysilicon emitter devic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making complementary bipolar polysilicon emitter devic will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1658026

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.