Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2006-12-05
2006-12-05
Ghyka, Alexander (Department: 2812)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
C361S523000, C361S525000, C427S079000, C427S080000
Reexamination Certificate
active
07144432
ABSTRACT:
A method of making a capacitor element used for a solid electrolyte capacitor is provided. The method includes steps of forming a dielectric layer, a solid electrolyte layer of manganese dioxide, a graphite layer and a metal layer in this order on an anode chip of valve metal. The method further includes a step of forming an intermediate layer between the electrolyte layer and the graphite layer. The intermediate layer is made by application of manganese nitrate solution containing 0.5–2.0 wt % of graphite powder or by application of a graphite material containing manganese dioxide powder.
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Ghyka Alexander
Hamre Schumann Mueller & Larson P.C.
Rohm & Co., Ltd.
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