Method of making buffer layers for III-V devices using solid pha

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148DIG3, 148DIG25, 148DIG41, 148DIG56, 148DIG154, 156612, 437 82, 437108, 437132, 437247, 437912, 437111, 437939, 437973, H01L 21203, H01L 2120, H01L 21324

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049525271

ABSTRACT:
A new III-IV buffer material is described which is produced by low temperature growth of III-V compounds by MBE that has unique and desirable properties, particularly for closely spaced, submicron gate length active III-V semiconductor devices, such as HEMT's, MESFET's and MISFET's. In the case of the III-V material, GaAs, the buffer is grown under arsenic stable growth conditions, at a growth rate of 1 micron/hour, and at a substrate temperature preferably in the range of 150 to about 300.degree. C. The new material is crystalline, highly resistive, optically inactive, and can be overgrown with high quality III-V active layers.

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