X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-12-06
2008-10-21
Kao, Chih-Cheng G (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S084000
Reexamination Certificate
active
07440546
ABSTRACT:
A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 μm (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.
REFERENCES:
patent: 5604782 (1997-02-01), Cash, Jr.
Liu et al., “Depth-graded multilayers for application in transmission geometry as linear zone plates”, Journal of Applied Physics, vol. 98, Issue 11, Dec. 13, 2005, pp. 113519-1 through 113519-6.
Windt et al., “X-ray multilayer coatings for use at energies above 100 keV”, Proceedings of SPIE, vol. 4012, Jul. 2000, pp. 442-447.
Multilayer Laue Lenses as High-Resolution X-ray Optics, by J. Maser et al., Proc. SPIE 5539, 194, 2004.
2005 R&D 100 Award Entry Multilayer Lens Wafers for X-Ray Lenses, by Chian Liu et al., Argonne National Laboratory.
Conley Raymond P.
Kang Hyon Chol
Liu Chian Q.
Macrander Albert T.
Maser Jorg
Kao Chih-Cheng G
Pennington Joan
UChicago Argonne LLC
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