Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2008-04-29
2008-04-29
Trinh, Minh (Department: 3729)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
C029S025420, C029S592100, C361S303000, C361S306100
Reexamination Certificate
active
07364598
ABSTRACT:
A method of making an orientation-insensitive ultra-wideband coupling capacitor, including the steps of securing an unterminated multi-layer capacitor of a low frequency portion of the orientation-insensitive ultra-wideband coupling capacitor, coating completely the unterminated multi-layer capacitor of the low frequency portion with an adhesion layer having opposing ends, creating a circumferential slot around the adhesion layer and thereby electrically separating the opposing ends of the adhesion layer from each other thereby restoring capacitance and forming a slotted body, applying a solder dam coating to all surfaces defining the circumferential slot to protect the circumferential slot, and plating the opposing ends of the adhesion layer so as to form solderable connections and thereby form the orientation-insensitive ultra-wideband coupling capacitor.
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patent: 5576926 (1996-11-01), Monsorno
patent: 6605127 (2003-08-01), Narusawa
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patent: 6690572 (2004-02-01), Liebowitz
patent: 6831824 (2004-12-01), Devoe et al.
patent: 7248458 (2007-07-01), Mruz
American Technical Ceramics Corporation
Mints, Levin, Cohn, Ferris, Glovsky and Popeo, P.C.
Trinh Minh
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