Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1990-12-14
1992-12-29
Nguyen, Nam X.
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427162, 427582, 427531, C23C 1400, B05D 500
Patent
active
051748762
ABSTRACT:
An optical electronic component, in which strip waveguides of limited depth and lateral width are formed in undoped dielectric substrate, e.g. an undoped crystal, by implantation of rare-earch ions or ions of transition metals, preferably laser-active ions with energies of 50 keV to 10 MeV.
REFERENCES:
patent: 4521443 (1985-06-01), Naik et al.
patent: 4787689 (1988-11-01), Korotky et al.
patent: 4840816 (1989-06-01), Appleton et al.
patent: 4886587 (1989-12-01), Miyawaki
patent: 4938836 (1990-07-01), Carenco et al.
Guide Wave Modulators in Ti Ion Implanted LiNbO.sub.3 Waveguides, Paul R. Ashley, et al, Journal May 5, 1989.
Erbium Implanted in III-V Materials, Rochaix et al, Japanese Journal of Applied Physics, vol. 27, Dec. 1988.
Fabrication of Low-Loss Optical Fibres Containing rare-Earch Ions, Poole et al, Jul. 15, 1985, UK.
Buchal Christoph
Sohler Wolfgang
Dubno Herbert
Forschungszentrum Julich GmbH
Nguyen Nam X.
LandOfFree
Method of making an optical component by ion implantation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making an optical component by ion implantation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making an optical component by ion implantation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1884851