Semiconductor device manufacturing: process – Making passive device
Reexamination Certificate
2005-06-21
2005-06-21
Weiss, Howard (Department: 2814)
Semiconductor device manufacturing: process
Making passive device
C438S411000, C438S422000
Reexamination Certificate
active
06908825
ABSTRACT:
The invention relates to a method of making an integrated circuit inductor that comprises a silicon substrate and an oxide layer on the silicon substrate. In one aspect, the method comprises depositing an inductive loop on the oxide layer, and making a plurality of apertures in the oxide layer beneath the inductive loop. The method also comprises providing a plurality of bridges adjacent the apertures and provided by portions of the oxide layer between an inner region within the inductive loop and an outer region of the oxide layer without the inductive loop, the inductive loop being supported on the bridges. The method comprises forming a trench in the silicon substrate beneath the bridges, to provide an air gap between the inductive loop and the silicon substrate.
REFERENCES:
patent: 5539241 (1996-07-01), Abidi et al.
patent: 5742091 (1998-04-01), Hebert
patent: 5831331 (1998-11-01), Lee
patent: 6153489 (2000-11-01), Park et al.
patent: 6169320 (2001-01-01), Stacey
patent: 6180433 (2001-01-01), Furey et al.
patent: 6211056 (2001-04-01), Begley et al.
patent: 6221727 (2001-04-01), Chan et al.
patent: 6242791 (2001-06-01), Jou
patent: 6274920 (2001-08-01), Park et al.
patent: 6287931 (2001-09-01), Chen
patent: 05082736 (1993-04-01), None
patent: WO 97/45873 (1997-12-01), None
Hutte, des Ingenieurs Taschenbuch 28 ed., vol. IV A, p. 446 Wilhem Ernst & Sohn, Berlin (DE) 1957.
Feng Hanhua
Foo Pang Dow
Sridhar Uppili
Xu Bai
Xu Shuming
Institute of Microelectronics
Knobbe Martens Olson & Bear LLP
Pizarro-Crespo Marcos D.
Weiss Howard
LandOfFree
Method of making an integrated circuit inductor wherein a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making an integrated circuit inductor wherein a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making an integrated circuit inductor wherein a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3506755