Method of making an ink jet printhead having a narrow ink...

Details Method of making an ink jet printhead having a narrow ink... Method of making an ink jet printhead having a narrow ink...

2005-03-15

2005-03-15

Alanko, Anita (Department: 1765)

Etching a substrate: processes

Forming or treating thermal ink jet article

C216S051000, C216S067000, C216S079000, C216S099000

Reexamination Certificate

active

06866790

ABSTRACT:
A method of forming a fluid ejecting device such as an ink jet printing device that includes forming a plurality of fluid drop generators on a first surface of a silicon substrate, forming a partial fluid feed slot in the silicon substrate by deep reactive ion etching, and forming a fluid feed slot by wet etching the partial fluid feed slot.

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