Method of making an implanted resistor, and resistor obtained th

Electrical resistors – Incased – embedded – or housed

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29610R, 156653, 156657, 338308, 427103, H01C 102, H01C 1700, B05D 512, B44C 122

Patent

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047258101

ABSTRACT:
This method of making an implanted resistor comprises the steps of implanting the resistor with ordinary techniques and deposition over the implanted resistor of a polysilicon layer having a set thickness and fully covering the resistor. Thus, the resulting resistor is unaffected by any subsequent thermal treatments and its value remains constant irrespective of any high potential metal layers or connections crossing it. The method affords in particular resistive values of the order of 1 kOhms/square.

REFERENCES:
patent: 3570114 (1971-03-01), Bean et al.
patent: 4167804 (1979-09-01), Greenstein
patent: 4326213 (1982-04-01), Shirai et al.
patent: 4367580 (1983-01-01), Guterman
patent: 4467312 (1984-08-01), Komatsu

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