Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1993-06-29
1995-02-21
Niebling, John
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
2041291, 205124, 437228, B23H 300
Patent
active
053912691
ABSTRACT:
We have found that etching of a body that comprises exposed Si as well as a Ti-comprising metal layer (e.g., a patterned Ti/Pt layer) in an amine-based anisotropic etchant for Si (e.g., 100.degree. C. EDP) frequently results in undesirable changes in the Ti-comprising metal layer. We have also found that the changes can be substantially reduced or eliminated by electrolytic means, namely, by making the metal layer the anode in an electrolytic cell that contains the etchant.
REFERENCES:
patent: 4765865 (1988-08-01), Gealer et al.
patent: 5179609 (1993-01-01), Blonder et al.
"Water-Amine-Complexing Agent System", by R. M. Finne et al., Journal of the Electrochemical Society, vol. 114(9), pp. 956-970, Sep. 1967.
"Wet Silicon Etching with Aqueous Amine Gallates", by H. Linde et al., Journal of the Electrochemical Society, vol. 139(4), pp. 1170-1174, Apr. 1992.
Fiering Jason O.
Miller Barry
Shmulovich Joseph
AT&T Corp.
Niebling John
Pacher Eugen E.
Wong Edna
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