Method of making a thin film thermal print head

Details Method of making a thin film thermal print head Method of making a thin film thermal print head

1978-05-24

1979-09-25

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156656, 219216, C23C 1500

Patent

active

041690320

ABSTRACT:
A thin film thermal print head is fabricated using radio frequency (rf) or direct current (DC) sputtering within a vacuum chamber into which is introduced a partial pressure of argon and nitrogen. Without breaking the vacuum, three consecutive layers comprising respectively tantalum nitride, gold, and tantalum nitride are sputter deposited and a diffusion barrier formed on a glazed substrate material. After these steps the desired land patterns are formed by photo lithographic techniques and chemical etching and finally sealant and abrasion resistant coatings are applied.

REFERENCES:
patent: 3400066 (1968-09-01), Caswell
patent: 3558461 (1971-01-01), Parisi
patent: 3973106 (1976-08-01), Ura
patent: 4105892 (1978-08-01), Tashiro
S. Shibata, et al., "New Type Thermal Printing Head," IEEE Trans. on Parts, Hybrids, & Packaging, vol. PHP-12, pp. 223-230, (1976).

Affiliated with

Also associated with

Rating

Method of making a thin film thermal print head does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a thin film thermal print head, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a thin film thermal print head will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1985393