Method of making a sputtering target for a bismuth based superco

Details Method of making a sputtering target for a bismuth based superco Method of making a sputtering target for a bismuth based superco

1989-04-21

1991-10-22

Lowe, James

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

264 60, 505725, H01L 3912

Patent

active

050595857

ABSTRACT:
A method for fabricating a low resistivity target for sputtering a bismuth-calcium-strontium-copper oxide superconductor. The method includes the steps of: preparing ingredient powders of a calcium carbonate, a strontium carbonate and a copper oxide; producing a porous bulk body of a complex oxide from the ingredient powders; and impregnating molten bismuth into the porous bulk body of the complex oxide.

REFERENCES:
patent: 4920094 (1990-04-01), Nogawa et al.
Nakao et al, "Magnetron Sputtering of Bi-Ca-Sr-Cu-O Thin Films with Superconductivity above 80K" Jap Journ App Phys 3/1988.

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