Method of making a semiconductor device with a capacitor

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437 52, 437 60, 437238, 437919, H01L 2170

Patent

active

053786459

ABSTRACT:
A method of manufacturing a semiconductor device having a capacitor comprises the steps of forming a silicon oxide layer on a semiconductor substrate, forming a first silicon nitride layer on the silicon oxide layer, forming a polycrystalline silicon layer as a lower electrode layer of the capacitor on the first silicon nitride layer, subjecting the polycrystalline silicon layer to the natural outside atmosphere so as to form a native oxide layer on the polycrystalline silicon layer, removing the native oxide layer to expose the polycrystalline silicon layer to an inactive gas atmosphere, Forming a second silicon nitride layer on the exposed polycrystalline silicon layer subjecting the second silicon nitride layer to the outside atmosphere so as to form a capacitor oxide layer on the polycrystalline silicon layer, the second silicon nitride layer and the capacitor oxide layer working as a dielectric layer of the capacitor, and forming an upper electrode layer of the capacitor on the capacitor oxide layer.

REFERENCES:
patent: 4438157 (1984-03-01), Romano-Moran
patent: 5032545 (1991-07-01), Doan et al.
patent: 5104819 (1992-04-01), Freiberger et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making a semiconductor device with a capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a semiconductor device with a capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a semiconductor device with a capacitor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2211176

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.