Method of making a semiconductor device utilizing a light-sensit

Details Method of making a semiconductor device utilizing a light-sensit Method of making a semiconductor device utilizing a light-sensit

1973-10-16

1976-06-01

Powell, William A.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

156 4, 156 13, 156 17, 252 793, C09K 1308

Patent

active

039605590

ABSTRACT:
A light-sensitive etching agent comprising (a) a photodecomposable compound forming upon decomposition a material capable of etching a silicon compound containing film or capable of etching the film after reaction with another material, (b) a material capable of forming water upon exposure to light, (c) a binder and (d) a solvent, and a method of making a semiconductor device utilizing the light-sensitive etching agent.

REFERENCES:
patent: 3520685 (1970-07-01), Schaefer
patent: 3520686 (1970-07-01), Kopczewski
patent: 3529963 (1970-09-01), Marchese

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