Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Patent
1979-06-25
1980-12-02
Lazarus, Richard B.
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
29 2517, H01J 912
Patent
active
042362873
ABSTRACT:
A high current density cathode capable of operating at current densities of A/cm.sup.2 to 30A/cm.sup.2 in the temperature range of 900 degrees C. to 1125 degrees C. is prepared by machining a porous high purity tungsten pellet containing copper in its pores and also containing about 0.6 to 2 weight percent of an activator to the desired cathode shape without reducing the pores of the emitter pellet. The pellet is then fired at 1800 degrees C. in a non-oxidizing atmosphere to remove the copper filler material. The pellet is then impregnated with Ba.sub.5 Sr(WO.sub.6)2 at a temperature of 1900 degrees C. in a dry inert gas atmosphere and the impregnated emitter then fired in dry hydrogen atmosphere at about 1840 degrees C. for about 2.5 to 5 minutes.
REFERENCES:
patent: 2945150 (1960-07-01), DeSantis et al.
patent: 3076916 (1963-02-01), Koppius
patent: 3118080 (1964-01-01), Koppius
patent: 3303559 (1967-02-01), Holtzclaw
patent: 3525135 (1970-08-01), Bondley
patent: 3971110 (1976-07-01), Thomas et al.
Edelberg Nathan
Gordon Roy E.
Lazarus Richard B.
Murray Jeremiah G.
The United States of America as represented by the Secretary of
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