Method of making a rim-type phase-shift mask and mask manufactur

Details Method of making a rim-type phase-shift mask and mask manufactur Method of making a rim-type phase-shift mask and mask manufactur

1996-12-03

1999-09-21

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430324, G03F 900

Patent

active

059552220

ABSTRACT:
A method of making a rim-type phase shift mask comprising the steps of: providing a substrate having opposing first and second surfaces, the first surface being at least partially covered with a first layer of material that substantially blocks the transmission therethrough of electromagnetic radiation of the predetermined range of wavelengths; forming a plurality of openings extending through the first layer so as to expose underlying portions of the first surface of the substrate; depositing a layer of hybrid photoresist on the first layer; exposing the second surface of the substrate to electromagnetic radiation to activate the desired portions of the hybrid photoresist; developing the photoresist, thereby exposing portions underlying the resist; and etching the exposed portions of the substrate is disclosed. The hybrid photoresist material may be exposed at varying doses to alter the placement of the area that is soluble in developer solution so that the phase shifter may be placed in various areas, but is always aligned in a fixed relationship with the edge of the blocking material.

REFERENCES:
patent: 5194345 (1993-03-01), Rolfson
patent: 5300379 (1994-04-01), Dao et al.
patent: 5302477 (1994-04-01), Dao et al.
patent: 5348826 (1994-09-01), Dao et al.
patent: 5358827 (1994-10-01), Garofalo et al.
patent: 5382483 (1995-01-01), Young
patent: 5384219 (1995-01-01), Dao et al.
patent: 5403682 (1995-04-01), Lin
patent: 5465859 (1995-11-01), Chapple-Sokol et al.
patent: 5484672 (1996-01-01), Bajuk et al.

Affiliated with

Also associated with

Rating

Method of making a rim-type phase-shift mask and mask manufactur does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making a rim-type phase-shift mask and mask manufactur, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a rim-type phase-shift mask and mask manufactur will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-78597